Developments in surface contamination and cleaning. Volume 2, Particle deposition, control and removal
- نوع فایل : کتاب
- زبان : انگلیسی
- مؤلف : Rajiv Kohli; K L Mittal
- ناشر : Amsterdam : Elsevier,
- چاپ و سال / کشور: 2010
- شابک / ISBN : 9781437778304
Description
Particle Deposition onto Enclosure Surfaces; Contamination Control: A Systems Approach; Particles in Semiconductor Processing; Continuous Contamination Monitoring Systems; Strippable Coatings for Removal of Surface Contaminants; Ultrasonic Cleaning. [v. 1.] Fundamentals and applied aspects -- v. 2. Particle deposition, control and removal.
Suitable for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination, this title provides guidance on some of the best-practice cleaning techniques and the avoidance of surface contamination. It covers contamination and cleaning issues at the nanoscale. It offers a look at ultrasonic cleaning.
